Green Silicon Carbide #1250

Green Silicon Carbide #1250 is an ultra-fine abrasive powder for precision grinding and fine surface finishing. Its controlled particle size helps minimize uneven scratches and improves surface uniformity, solving common issues such as unstable polishing results and inconsistent finish quality. It is widely used in advanced grinding, lapping, and precision component processing.

Applications:

  • Semiconductor wafer processing
  • Optical glass and crystal polishing
  • Precision lapping and grinding
  • Tungsten carbide machining
  • Ceramic material processing
  • Electronic component finishing

Description

Green Silicon Carbide #1250

Green Silicon Carbide Micro Powder is manufactured from premium green silicon carbide grit through crushing, acid washing, overflow classification, siphon classification, drying, and precision particle size control. The advanced siphon classification process ensures a narrow particle size distribution, high purity, and excellent consistency, making the powder ideal for high-precision applications. Available in F240–F3000 and JIS #240–#20000, it is widely used for precision lapping and polishing of optical glass, sapphire, semiconductor wafers, precision ceramics, magnetic materials, and other components requiring superior surface finish and dimensional accuracy.

Green Silicon Carbide #1250 Key Features

01

High Hardness

Mohs hardness up to 9.2, providing excellent cutting ability and
long service life for precision processing.

02

High Purity

High SiC content and low impurity level ensure stable polishing
performance and consistent quality.

03

Fine Particle Distribution

Controlled particle size distribution provides excellent polishing
accuracy and uniform surface finishing.

04

Excellent Chemical Stability

Maintains stable performance under demanding polishing and
high temperature processing conditions.

Green Silicon Carbide #1250 Available Sizes

 

  • FEPA F Micro Grit:
    F230, F240, F280, F320, F360, F400, F500, F600, F800, F1000, F1200, F1500, F2000, F2500, F3000
  • JIS:
    #240, #280, #320, #360, #400, #500, #600, #700, #800, #1000, #1200, #1500, #2000, #2500, #3000, #4000, #6000, #8000, #10000, #20000
  • Micron Size:
    63 μm, 40 μm, 28 μm, 20 μm, 14 μm, 10 μm, 7 μm, 5 μm, 3.5 μm, 2.5 μm, 1.5 μm, 1.0 μm, 0.5 μm (Custom Available)

Green Silicon Carbide #1250 Applications

 

Precision Lapping & Polishing

Used for high-precision polishing of optical glass, sapphire, semiconductor wafers, and precision components, achieving excellent surface finish.

Semiconductor & Photovoltaic Industry

Applied in wafer slicing, grinding, and surface processing of silicon wafers and other semiconductor materials.

Optical Glass Processing

Used for precision grinding and polishing of lenses, crystals, and optical components with high surface quality requirements.

Advanced Ceramics & Electronic Materials

Applied in the processing of ceramic substrates, electronic components, and hard materials requiring high dimensional accuracy.

Green Silicon Carbide #1250 Technical Data

 

Physical Properties

Item Value
Appearance Green Powder
Mohs Hardness 9.2
Basic Mineral α-SiC (Silicon Carbide)
True Density ≥3.90 g/cm³
Bulk Density 1.2–1.6 g/cm³
Crystal Structure Hexagonal
CAS No. 409-21-2
HS Code 2849200000

Chemical Composition (%)

Model Particle Size SiC F.C. Fe₂O₃
GC F230–F280 (#240–#360) ≥98.40 ≤0.20 ≤0.25
F320–F500 (#400–#800) ≥98.20 ≤0.20 ≤0.30
F600–F800 (#1000–#1500) ≥98.00 ≤0.20 ≤0.30
F1000–F1200 (#2000–#2500) ≥97.60 ≤0.20 ≤0.30
#3000–#8000 ≥96.50 ≤0.20 ≤0.30
#10000–#20000 ≥96.00 ≤0.20 ≤0.30

Particle Distribution (μm)

Particle Size D0 D3 D50 D94
#240 ≤127 ≤103 58.6±3.0 ≥40.0
#320 ≤98.0 ≤74.0 41.1±2.5 ≥27.0
#400 ≤75.0 ≤58.0 30.9±2.0 ≥20.0
#600 ≤53.0 ≤43.0 21.1±1.5 ≥13.0
#800 ≤38.0 ≤31.0 14.7±1.0 ≥9.0
#1000 ≤32.0 ≤27.0 11.9±1.0 ≥7.0
#2000 ≤19.0 ≤17.0 6.9±0.6 ≥4.0
#4000 ≤11.0 ≤8.0 3.0±0.4 ≥1.3
#8000 ≤6.0 ≤3.5 1.2±0.3 ≥0.6
#20000 0.50

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